NANO-C, INC. AND IRRESISTIBLE MATERIALS, LTD. ENTER INTO A STRATEGIC BUSINESS
RELATIONSHIP TO ADVANCE MUTUAL BUSINESS INTERESTS
Nano-C acquires LiquidCarbon™ patent portfolio from Irresistible Materials, Ltd.
WESTWOOD, MA, USA and BIRMINGHAM, United Kingdom, June. 22nd, 2026
Nano-C, Inc., a leader in the development of nanostructured carbon, electronic materials, and specialty chemicals, has acquired an advanced lithography patent portfolio from Irresistible Materials, Ltd. (IM), a leader in the development of novel photoresist materials for extreme ultraviolet (EUV) lithography.
Nano-C and IM have been long-term partners in the development of leading-edge lithography materials. Nano-C’s acquisition of IM’s novel LiquidCarbonTM patent portfolio enables the company to develop and supply high-carbon mask solutions to leading global semiconductor manufacturing companies. In turn, this will enable IM to have a strong focus on the R&D, manufacturing, and business development related efforts for its patented Multi-Trigger Resist (MTR™) targeted at the semiconductor industry’s leading Integrated Device Manufacturers (IDMs) and foundries for low-NA and high-NA EUV lithography. The terms of the transaction are not being disclosed.
As high-carbon content formulations, LiquidCarbon™ provides the rigid, ultra-thin mask necessary to etch complex structures for manufacturing chips for high power AI computing. With carbon content able to exceed 90%, these high value formulations can achieve carbon loading similar or exceeding CVD carbon processes. LiquidCarbon™ can be tuned along several key parameters in terms of concentration, solvents and chemical functionalization to optimize the most challenging lithography process demands.
IM’s MTR material is a patented small-molecule resist platform, designed with molecular dimensions up to 10 times smaller than those of conventional polymer-based resists to enable superior resolution and pattern fidelity. The MTR chemistry mechanism is being developed with the goal of minimizing blurring while achieving both reduced line-edge and line-width roughness (LER/LWR) and higher sensitivity for improved yield, addressing one of the key trade-offs in advanced EUV patterning. By targeting improved resist efficiency, the MTR platform aims to support faster processing and significantly lower CoO compared withconventional resist technologies.
"Both Nano-C and Irresistible Materials are very well positioned to address the rapidly evolving demands of high-performance lithography materials. This new strategic agreement will allow both companies to accelerate the development and commercialization of these novel materials, " said Viktor Vejins, CEO of Nano-C, Inc. "This LiquidCarbon™ product platform leverages the company’s global leadership in industrial scale nanocarbon production as these products are uniquely based on Nano-C’s core fullerene materials; which on their own are 100% carbon and can be formulated in fab-ready solvents to meet the stringent quality requirements in advanced chip manufacturing. "
"We are very pleased to have found a good home for our valuable LiquidCarbon™ patent portfolio which will serve as a strong complement to Nano-C’s advanced nanocarbon capabilities, " said Dinesh Bettadapur, Chief Executive Officer, Irresistible Materials. "This enables us to move forward rapidly with getting our proprietary MTR material ready for sampling and manufacturing scale up to meet the EUV lithography process needs of the industry’s leading chip manufacturers. ”